The CP-2200 is a manually loaded SMIF pod washing system. This system is for cleaning semiconductor device containers and is built with experiance advanced knowledge of the latest technology for Semiconductor equipment manufacturing.. It is suitable for pilot lines, research and development.
The CP-2200 can wash and dry 8 inch SMIF pods and also can wash 8 inch open cassettes.
SMIF POD inside/outside cover, inner base are cleaned & dried simultaneously by DI Water jet washing/high pressure hot air knife drying
POD rotation for precise cleaning and drying by point-blank set nozzle
Prevention of bacteria growth by drain a little DI water except machine is in cleaning process
Simple operation by touch panel
Small foot print design
Sequence controlled by PLC
Flushing function to prevent dead water inside the tank
Operator friendly various safety systems
Various options are available for specific customer needs
Setting system: Manual
Processing Object: 8” SMIF POD
Throughput: 1 set/15min
Main system：1300mm(W) × 900mm(D) ×1500mm(H) (Excluding any projections)
Sub system： 600mm（W）×1000mm（D）×1400mm（H） （Excluding any projections）