Cleaning FOUPs and FOSBs is required to improve and maintain the yeild of the semiconductor munufactring process.
The HNM-300 can wash and dry a variety of FOUPs and FOSBs in one system without changing the set-up because of our unique chamber structure.
High through-put (compared with our previous system)
Small foot print design
Protection from electrostatic charge
Super purity washing by nozzle jet
Hot air knife drying method will shorten drying time efficiently
Automatic FOUP Opener function (option)
Complete Drying by reliable and successful “hot air spraying” and “high speed spin”
Dust suppression, ESD elimination system equipping with fine filter and Ionizer
Securing working space for disassemble & assemble container (no need to arrange clean booth separately)
Automatic purging function to prevent growth of bacteria
Auto flushing fuction prevents dead water
Easy operation by touch panel
Ensure High safety with completion of various interlocking system
Dimension: 2300(W)x1400(D)x2200(H)mm (Excluding any projections)
Weight: 800kg
Power: 3 phase AC200+-10V
Exhaust: 3000 litter/min
Drain: 10 litter/min
D.I .Water:
Supply (10 litter/min as minimum)
Pressure (0.3Mpa)
CDA (Clean Dry Air)
Supply (2500 litter/min)
Pressure (0.75Mpa)
Automatic FOUP opener and filter for DI water are available as optional item